Phase masks are the production tool used to write gratings in fibers and waveguides. Ibsen Phase masks incorporate unbeatable, interferometric (holographic) patterning technology into a production friendly Phase mask.
– for cost-effective fabrication of very low period gratings, typically in high refractive index materials
Low-cost production of gratings on planar wafers can be accomplished by use of the Nearfield Holography (NFH) technique, which employs a special type of Phase mask. The Phase mask is made for easy use in a specially modified mask aligner (commercially available from Suss MicroTec) with a conventional UV source as illumination. This technology has distinct production advantages over grating fabrication by direct holography or direct e-beam technology. In addition of fabrication of gratings on semiconductor DFB lasers, the technique is also advantageous in a number of other fine-pitch applications within the telecommunications and sensor industries.
Sample applications include:
• DFB lasers
• DBR lasers
• Integrated planar optics
• Sensors
• Biochips
It is imperative that the Phase mask is accurate, uniform and defect-free. Through scientific principles and constants of nature, our fabrication process ensures absolute pitch accuracy.
All our production processes take place in a cleanroom environment, giving you high yield through nearly defect-free Phase masks. Phase masks and the NFH technology are thus suitable for mass production of distributed feedback (DFB) lasers.
Other important features of our line of 0/-1 order Phase masks are:
0/-1 order Phase mask principle sketch
| Parameter | Specification |
|---|---|
| Grating periods | 260 nm – 600 nm |
| Illumination wavelengths | 193 nm – 800 nm |
| Material | UV grade fused silica |
| Period accuracy | +/- 0.01 nm |
| Period uniformity | +/- 0.01 nm |
| Standard grating sizes | Ø1″ Ø2″ |
| Fringe visibility | >98% |
