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Nanoscribe – Quantum X

World’s first Two-Photon Grayscale Lithography system for maskless microfabrication of refractive and diffractive microoptics

Two-Photon Grayscale Lithography

Hand with glove holds two inch wafer with 3D printed structure

This breakthrough technology combines additive microfabrication with ultra-fast voxel size tuning: Two-Photon Grayscale Lithography (2GL) paves the way for ultra-fast, accurate and free-form microfabrication without compromising speed or accuracy.

Quantum X controls the voxel size along one scanning plane using synchronized laser power modulation at high speeds. In this manner, complex shapes are produced and variable feature heights are achievable within one scan field. Discrete and accurate steps as well as essentially continuous topographies can be printed on up to six-inch wafer substrates without the need for additional lithography steps or mask fabrication.

The Quantum X wizard guides you through the print job creation. The integrated software accepts grayscale images of up to 32-bit resolution for direct fabrication with 2GL. Diffractive and refractive microoptics in 2D and 2.5D materialize with smooth surfaces and high shape accuracy.

Two-Photon Grayscale Lithography
  • High-speed 2.5D microfabrication
  • Ultra-smooth surfaces and excellent shape accuracy
  • Design freedom with sub-micrometer resolution
  • Complete and ultrafast control over voxel size
  • Automated processes, e.g., calibration, job execution and monitoring
  • Wide choice of substrate–resin combinations
  • Continuous execution of various print jobs by job queue
  • Touchscreen and remote-control interfaces
Printing technologyTwo-Photon Grayscale Lithography (2GL)
Minimum XY feature size160 nm typical; 200 nm specified*
Finest XY resolution400 nm typical; 500 nm specified*
Finest vertical steps10 nm, quasi-continuous topographies possible
Minimum surface roughness Ra≤ 10 nm*
Scan speed≤ 250 mm/s*
Area printing speed3 mm²/h typical for diffractive optical elements

 

*Values may vary depending on the objective and photoresin in use.