World’s first Two-Photon Grayscale Lithography system for maskless microfabrication of refractive and diffractive microoptics
This breakthrough technology combines additive microfabrication with ultra-fast voxel size tuning: Two-Photon Grayscale Lithography (2GL) paves the way for ultra-fast, accurate and free-form microfabrication without compromising speed or accuracy.
Quantum X controls the voxel size along one scanning plane using synchronized laser power modulation at high speeds. In this manner, complex shapes are produced and variable feature heights are achievable within one scan field. Discrete and accurate steps as well as essentially continuous topographies can be printed on up to six-inch wafer substrates without the need for additional lithography steps or mask fabrication.
The Quantum X wizard guides you through the print job creation. The integrated software accepts grayscale images of up to 32-bit resolution for direct fabrication with 2GL. Diffractive and refractive microoptics in 2D and 2.5D materialize with smooth surfaces and high shape accuracy.
|Printing technology||Two-Photon Grayscale Lithography (2GL)|
|Minimum XY feature size||160 nm typical; 200 nm specified*|
|Finest XY resolution||400 nm typical; 500 nm specified*|
|Finest vertical steps||10 nm, quasi-continuous topographies possible|
|Minimum surface roughness Ra||≤ 10 nm*|
|Scan speed||≤ 250 mm/s*|
|Area printing speed||3 mm²/h typical for diffractive optical elements|
*Values may vary depending on the objective and photoresin in use.