CNI is dedicated to offer best quality laser source and laser marking machine with short pulse duration, high peak power, cost-effectiveness and high fine precise marking lines.Compared to traditional marking, the process is more efficient, non-tactile and without any mechanical stress, which is suitable for various marking fields such as diamond, metal, steel, IC, plastics, package, logo, etc. Besides, we can provide Raman spectrometer for Jewelry identification.
Archives: Product
Photon Systems – Deep UV Lasers
Deep ultraviolet for less. The DUV family of lasers offer 224.3 nm and 248.6 nm for fraction of the cost of the competition. The laser is the size, weight and power consumption of a HeNe laser but with output in the deep UV.
The self-contained, integrated, laser controller enables remote computer control for ease of operation and flexible data collection via LabView software. With an input power less than 10 W the need for water cooling and other thermal management issues is eliminated.
The lasers reach full power in less than 20 microseconds from a cold start from any ambient temperature from -200 to 100 C without preheating or temperature regulation. With output over 100mW and linewidths less than 3GHz or 0.0005nm these are great sources for a wide range of applications.
Nanoscribe – Quantum X
World’s first Two-Photon Grayscale Lithography system for maskless microfabrication of refractive and diffractive microoptics
Two-Photon Grayscale Lithography

This breakthrough technology combines additive microfabrication with ultra-fast voxel size tuning: Two-Photon Grayscale Lithography (2GL) paves the way for ultra-fast, accurate and free-form microfabrication without compromising speed or accuracy.
Quantum X controls the voxel size along one scanning plane using synchronized laser power modulation at high speeds. In this manner, complex shapes are produced and variable feature heights are achievable within one scan field. Discrete and accurate steps as well as essentially continuous topographies can be printed on up to six-inch wafer substrates without the need for additional lithography steps or mask fabrication.
The Quantum X wizard guides you through the print job creation. The integrated software accepts grayscale images of up to 32-bit resolution for direct fabrication with 2GL. Diffractive and refractive microoptics in 2D and 2.5D materialize with smooth surfaces and high shape accuracy.

YSL Mode Locked SC
YSL Photonics ’SC-Pro-M is the latest supercontinuum source with a seed source pulse duration of 6ps. It delivers a wide spectral output ranging from 410nm to 2400nm with over 7W total power. The optional 10kHz to 40MHz repetition rate capability also makes it an ideal source for the applications such as low noise OCT,fluorescence microscopy, nanophotonics and etc.
Applications:
• OCT
• Fluorescence Spectroscopy and Microscopy
• Nanophotonics
• Super-Resolution Imaging
• Photocurrent microscopy
Features:
• Wavelength: 410nm-2400nm
• Total power: 7W
• Repetition Rate: 80MHz
• Seed source pulse duration: ~6ps
• Single-Mode Output
Andor iKon-M 912
Andor’s back-illuminated iKon M 912 camera offers the ultimate in dynamic range and photon sensitivity, by virtue of a large 24 μm, high well depth pixel architecture. The camera also offers a QEmax of 95% and exceptionally low readout noise.
The iKon-M 912 benefits from negligible dark current with industry-leading thermoelectric cooling down to -100°C, enabling use of significantly longer exposure times than offered by any other camera on the market using this same sensor. The iKon-M platform offers Multi-Megahertz readout for more rapid acquisition or fast focusing, along with direct USB 2.0 connectivity to PC.
- 300,000 e- well depth
- TE cooling to -100°C
- QE max > 90 °C from back-illuminated sensor
- Ultra low noise readout
- Multi-Megahertz pixel readout
- UltraVac™
Andor iKon-M 934
Andor’s iKon-M 934 series cameras are designed to offer the ultimate in high-sensitivity, low noise performance, ideal for demanding imaging applications. These high resolution 1024 x 1024 CCD cameras boast up to 95% QEmax, high dynamic range, 13 μm pixels and exceptionally low readout noise. The iKon-M benefits from negligible dark current with industry-leading thermoelectric cooling down to -100°C.
The ‘Deep Depletion’ sensor option offers ultimate performance for NIR applications, the new Dual AR coating extends the QE performance significantly across the UV/visible region of the spectrum for the broadest possible spectral coverage from one sensor. Fringe Suppression Technology™ radically minimizes etaloning effects in the NIR. Rapid vertical shifts combined with fast kinetics acquisition mode, comprehensive trigger modes and custom coated wedge window options, render the deep Depletion models ideal for NIR optimized Bose Einstein Condensation applications.
Nanoscribe – Photonic Professional GT2
3D Microprinting – Straightforward and Versatile as Never Before
New features, new tools, and new processes extend the 3D microprinting capabilities of the Photonic Professional GT2 toward the macroscale, expanding the range of applications. The new 3D printer provides user-friendly solutions for multiple scales: The 3D Microfabrication Solution Sets.
The device combines the precision of two-photon polymerization with a field-proven and straightforward 3D printing workflow for nano-, micro-, and mesoscale structures up to millimeter dimensions. The printers offer a high degree of automation and are used for additive manufacturing and maskless lithography. The Photonic Professional GT2 is the ideal instrument for highest precision 3D printing for a broad range of use cases.
Okolab – LEO 2.0
Okolab – Heating and Cooling Stage Top Incubator
Stage Top Incubator – Water Jacket Incubator
T range: from 10–15 °C below ambient (model dependent) up to 60 °C
Okolab – Bold Line Stage Line Incubator
The Bold Line Top Stage Incubator is the latest release from OKOLAB in terms of Top Stage incubation. It delivers superior temperature stability, humidity, CO2 and Oxygen control in a fully integrated fashion.